ASML ED EUV DE SP FC79 and 80 Spect.Pure EUV Coll-Senior Architect in Veldhoven, Netherlands

Introduction

Would you like to (co) define and maintain the roadmap for the source Extreme Ultra Violet (EUV) Collection function? Do you have experience being involved in critical issues as a technical lead? Do you have 5-10 years of relevant experience in an optical architect role in an industrial setting? Then this could be your next challenging job.

EUV lithography systems enable our customers to create next generation consumer electronics (like smartphones, tablets, etc.). For this the EUV lithography system needs a push towards an industrialized product so our customers can use it a profitable way. The Source Performance department defines and provides solutions for current and future systems to improve the performance of the EUV light source.

The Source Performance department is a 80 FTE large department with several groups with different specialisms. You will work in multidisciplinary teams driving product development step by step.

The holder of this position is reporting to the EUV Collection Group Leader.

Job Mission

As Senior Architect EUV Collection you will be a key player in a very fast-paced, multidisciplinary environment. You will be involved as the main functional interface between source and scanner. The functions cover the EUV source-to-scanner alignment, EUV transmission and out-of-band radiation management, and diagnostics as well. You get the chance and you are encouraged to integrate with the dynamic and diverse ASML community. And you will interact daily with 4,000 like-minded professionals. At the ASML Source Performance department, a little flexibility and commitment can go a long, long way.

Job Description

In the source vessel dozens of kilowatts of IR laser power are partly converted into EUV radiation. The EUV radiation needs to be collected and transmitted to the scanner as efficiently as possible, while the IR radiation needs to be absorbed and not transmitted to the scanner and the laser. Together with the overall architect you are responsible to define and maintain the roadmap for the EUV Collection function. This covers alignment towards scanner, IR, DUV, and Far Field properties including diagnostics. Based upon this roadmap you will define work packages including budgets and requirements. Aside of that you will be involved as technical lead in critical issues. During handling such issues you will be confronted having many technical uncertainties at sub-module level. First of all you will need to generate creative solutions to contain the issue to allow our customer to continue, and as next step understand these uncertainties well to propose a structural solution. To get to a solution you gather information, and create scenarios to come to a decision. Finally you show that you take ownership for the issue and responsibility for the decisions. During all this you will be cooperating with other disciplines where it is expected that you drive design aspects, analyze system problems, and support and plan issue resolution with peers. You will be part of the SW and integration team within the project. You will report the progress of above activities to the main stakeholders: the EUV SW & Integration team leader, the EUV Collection project leader, the EUV collection function owner, and the overall EUV Collection architect.

Education

Master or PhD degree in one of the following: Physics, Optics, Mechatronics or Mechanical Engineering.

Experience

From 5-10 years relevant experience in an optical architecture role in an industrial setting.

Personal skills

ASML Development and Engineering department is a very big department with a lot of interaction. A person needs business sense to prioritize his/her work and needs to be able to handle some chaos every once and a while. It is very important that the person keeps his/her goal on the radar and understands that even though barriers may seem large sometimes, those barriers need to be concurred and the person should understand which stakeholders in his/her environment can help with this.

This goal orientation is also key since in a big company like ASML a lot of processes are used to roll out the deliverables of a development team in proper way, handling these processes is very important, but not the goal in itself.

Though in every ASML department you work in teams, you also need to take a lot responsibility over your work. This means that you need to be self-propelling where an entrepreneurial mindset will help you a long way. In your role you need to be able to communicates clear to technical team and D&E; about directions, expectations, and follow up needed and providing feedback on results. You are able to interface, motivate and convince without using formal authority. You remain effective when confronted with time pressure, resistance and setbacks. English is our home language and needless to say that you need good communication skill to work in teams, handle stakeholders and train multicultural teams all over the world.

Context of the position

EUV lithography systems enable our customers to create next generation consumer electronics (like smartphones, tablets, etc.). For this the EUV lithography system needs a push towards an industrialized product so our customers can use it a profitable way. The Source Performance department defines and provides solutions for current and future systems to improve the performance of the EUV light source.

The Source Performance department is a 80 FTE large department with several groups with different specialisms. You will work in multidisciplinary teams driving product development step by step.

The holder of this position is reporting to the EUV Collection Group Leader.

##

Location: Veldhoven, Netherlands

Level: Master

Experience: 5-10 Experienced

Available since: 4/17/2018

Functional area: EUV, System Engineering, Design Engineering

Background: Physics, Optics

Reference: req1424